Nanometrics Releases NanoCD Suite Version 2.0

By DE Editors

Nanometrics Inc. (Milpitas, CA), a supplier of advanced process control metrology equipment, released NanoCD Suite Version 2.0 for optical critical dimension (OCD) metrology, designed for demanding process control applications.

  The NanoCD Suite Version 2.0 is comprised of scalable fab-wide OCD metrology solutions, including the NanoGen, NanoMatch, NanoStation, and NanoDiffract. Featured in the suite are modeling methods, a next-generation run time engine,  offline analysis tools and an intuitive user interface for structure definition and modeling. Scalable resources within the NanoGen enterprise class server are to be deployed and shared between various users and systems within the NanoCD Suite environment.

  There is interoperability between Nanometrics’ metrology product portfolio, so that users can use components of the NanoCD Suite in concert with standalone Atlas XP and Atlas-M systems for wafer and reticle metrology, as well as the IMPULSE/9010 integrated metrology product portfolio, for example.

  An optimized workflow for OCD applications development includes enhancements in NanoDiffract allow users to control their process based on measurements of key parameters directly on DRAM, Flash, and SRAM cells. This allows process engineers to optimize their metrology needs and pinpoint sensitivity before initial wafers are processed.

Sources: Press materials received from the company and additional information gleaned from the company’s website.