Lynx Metrology System Launched

By DE Editors

Nanometrics Incorporated (Milpitas, CA) announced the launch of its new Lynx metrology platform at SEMICON West 2008 in July. The Lynx is a compact 300mm cluster metrology platform that makes possible thin film, optical critical dimension (OCD) and overlay measurements in a single system. The Lynx provides for a range of custom configurations, from one single metrology platform to a multi-metrology platform. To extend system capabilities, modules can be easily installed or upgraded.

Nanometrics’ proprietary cluster control software allows for “sequence and recipe customization in a high-volume production environment.” The Lynx’s cluster architecture is responsible for a significant cost of ownership improvement, and allows customers to configure each tool to suit their process control and sampling requirements.

For more information, visit Nanometrics.

Sources: Press materials received from the company and additional information gleaned from the company’s website.