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Heidelberg Instruments Sells Advanced Maskless Laser Lithography System

Maskless lithography systems can be used to provide quick turnaround on new device designs for plastic electronics.

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By DE Editors  

September 11, 2008

By DE Editors

Heidelberg Instruments GmbH (Heidelberg, Germany) recently announced the sale of an advanced DWL 66FS maskless laser lithography system to the Printable Electronics Technology Centre (PETEC) of Sedgefield,UK. With an installed base in more than 30 countries, Heidelberg’s DWL 66FS maskless lithography systems can be used, as in the case of PETEC, to provide a quick turnaround on new designs of devices and circuits for plastic electronics. PETEC will also use the new system to investigate the effects of distortion and misalignment on device performance in multilayer patterned devices on flexible substrates.

Features of Heidelberg’s DWL 66FS maskless lithography system include capability for binary and gray scale exposure, layer to layer alignment, and production of sub micron features.

For further information on DWL 66FS visit Heidelberg Instruments GmbH.

Sources: Press materials received from the company and additional information gleaned from the company’s website.

 

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